H2 S 和 CH 3 S H 与硅锡烯加成反应的理论研究

Theoretical Study on the Addition Reactions of H2S and CH3SH with Silastannene

  • 摘要: 采用密度泛函理论方法研究了 H 2 S 及 CH 3 S H 与硅锡烯的加成反应的微观机理和势能剖面 . 计算结果表明, 所研究反应由多步机理组成且反应的初始步骤为 H 2 S 或 CH 3 S H 对硅锡烯的亲核进攻 . 反应过程中S i ( S n ) -S 键总是先于 S n ( S i ) -H 键形成 . 形成 S i -S 键的反应在动力学上比形成 S n-S 键的反应有利, 且主要由能量因素决定 . CH 3 S H作为亲核反应试剂比 H 2 S 更活泼 .

     

    Abstract: The mechanism and potential energy surface of the addition reactions of H2S and  CH3SH to silastannene were studied by using density functional theory (DFT). The obtained results show that all reactions consist of a multi-step mechanism and the initial step of the reactions is a nucleophilic attack of H2S or  CH3SH toward silastannene. The formation of Si-S or Sn-S bond is always prior to that of Sn-H or Si-H bond in all studied reactions. The reactions involving a forming Si-S bond are more favorable than those containing a forming Sn-S bond kinetically, which is determined by energy factor.  CH3SH as a nucleophile is more reactive toward silastannene than H2S

     

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