电化学自组装法制备透明ZnO薄膜及性能研究

Fabrication of Transparent Zinc Oxide Film with Electrochemical Deposition

  • 摘要: 以低浓度的Zn(NO3)2为电解液、KCl为支持电解质,采用电沉积自组装法在氧化铟锡(ITO)玻璃基片上成功制备了尺寸可控、性能优异、具有强的C轴择优取向生长的纳米柱ZnO薄膜;并进一步获得了六方晶体纳米结构的ZnO薄膜的优化沉积工艺.同时,结合X射线衍射(XRD)、扫描电镜测试(SEM)、透射电镜(TEM)、紫外吸收光谱(UV vis)等测试手段对薄膜的形貌、晶形及光学性能进行了系统表征.结果表明,制备的ZnO薄膜为六方纤锌矿结构,且沿002方向的择优生长趋势明显、物相纯正;该薄膜的透射率最大值可达75%,禁带宽度接近于3.28 eV

     

    Abstract: Zinc oxide(ZnO) films were electrodeposited from low concentration of Zn(NO3)2 as electrolyte on the ITO substrates. The electrochemical method has the ability to “tailor” deposited structure, properties and to form a highaspectratio ZnO film. And optimized condition hexagonal crystal of ZnO film has been determined ultimately. The morphology, microstructure and optical performance of ZnO films were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) , Xray diffraction (XRD) etc. The effects on different concentrations of Zn2+, NO3- and C- in electrolyte on the growth of ZnO nanopillars were studied. The results showed that ZnO nanocrystalline thin films has wrutzite structure and growth tendency of [002] orientation obviously. Optical characterizations showed that the maximum value of optical transmittance of the film up to 75%, the optical bandgap energy value was about to 3.28 eV.

     

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